Maskmaking – 50 Years of History in Enabling Moore’s Law Will Continue with EUV
If a picture is worth a thousand words, how many words is a photomask worth? SPIE’s 2017 Advanced Lithography Conference is underway and Dr. Frank Abboud, Vice President Technology Manufacturing Group and General Manager, Intel Mask Operation kicked off his keynote presentation “Photomask Technology Challenges for Upcoming technology Nodes” by comparing the amount of digitized data in a 14nm photomask...
EUV Lithography – Progress on the Journey to Manufacturing Magic
SPIE’s annual Advanced Lithography conference is underway, and as Intel’s Britt Turkot, senior principal engineer in Logic Technology Development Lithography, described in her keynote, significant strides have been made in EUV lithography over the past year taking the technology from a question of if to a question of when. EUVL is solidly on a path to HVM insertion as soon...