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Daily Archives: February 20, 2009

Performance Headroom from Squeezing Transistors Down to 32nm

By ken kaplan on February 20, 2009

Since the turn of the millennium, I’ve seen advances in chip manufacturing processes — from circuitry measuring 180 nanometers to 130 to 90 to 65 to 45 and now 32nm — and new architectural designs in between. Every time a … Read more >

Categories: IDF  |  Tagged as: 32nm, design, IDFShanghai08, Intel, Intel History, investment, manufacturing, microprocessor, multipath, recession, Westmere

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